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Cleaving Photoresist

SEM image of Photoresist prepared with the LatticeAx
SEM image of Photoresist prepared with the LatticeAx

Photoresist, because it is soft, makes it difficult to cross section mechanically or with the FIB. The best solution is to cleave the sample and image it directly in the SEM. This makes the LatticeAx the perfect tool for sample preparation of photoresist cross sections. The resist structure is not changed in the process and the simple cleave is achieved in <5 minutes.

Cleaving a Die Attached to a Host Substrate

Cleaving Stacked Die
Cleaving Stacked Die

The original die was depackaged, too thin to handle any other way, the die was attached to a host substrate. The LatticeAx was used to downsize the sample in preparation for further processing. The indent was created on the host substrate. No special process was used to indent and cleave the sample.

Downsizing die to fit your Prober or SEM or FIB sample holder

Downsize die to fit your Prober, SEM or FIB sample holder without any “cracking” risk

Using the LatticeAx, a controlled, precise cleaving process was developed to downsize out-of-a-package samples repeatedly in <1-min. No skills required and no pre-prep. Single step for thin samples (‘out-of-a-package’ die or back-thinned samples): Using the LatticeAx’s microline indent to cleave, the cleaving step was eliminated.  For thicker samples (or die on a host), a 2 step process, microline indent + 3-point cleave is used. These processes enable hard to prepare thin and thick back end samples to be prepared.

n-probe stub
Out-of-package samples prepared using the LatticeAx. Bottom right shows sample on n-prober stub.