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Cleaving Photoresist

SEM image of Photoresist prepared with the LatticeAx
SEM image of Photoresist prepared with the LatticeAx

Photoresist, because it is soft, makes it difficult to cross section mechanically or with the FIB. The best solution is to cleave the sample and image it directly in the SEM. This makes the LatticeAx the perfect tool for sample preparation of photoresist cross sections. The resist structure is not changed in the process and the simple cleave is achieved in <5 minutes.

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