For non-USA orders, call 530-243-2200; 800-237-3526 or email us
Call UsCall us at (530) 243-2200

Semiconductor

[vc_row css=”.vc_custom_1465508912509{margin-top: 0px !important;margin-right: 0px !important;margin-bottom: 0px !important;margin-left: 0px !important;border-top-width: 0px !important;border-right-width: 0px !important;border-bottom-width: 0px !important;border-left-width: 0px !important;}”][vc_column][vc_column_text css=”.vc_custom_1465509022404{background-color: rgba(209,209,209,0.53) !important;*background-color: rgb(209,209,209) !important;}”]

Semiconductor

[/vc_column_text][vc_row_inner][vc_column_inner width=”1/4″][vc_column_text]

Downsizing and thin out of package die

[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text]

n-probe stub
Preparing samples for probing, SEM or FIB

[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text]

300 mm wafer cleaved by the LatticeAx
Downsizing wafers with cleaving and scribing tools

[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text]

Cleaved copper bumps
Cleaving Copper Bumps

[/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner][vc_column_inner width=”1/4″][vc_column_text]

Cleaving Samples with Rotated Lithography

[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text]

Preparing samples 1 mm wide
Preparing samples 1 mm wide

[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text]

Fabricated Nanostructure after cleaving

[/vc_column_text][vc_column_text][/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text][/vc_column_text][vc_btn title=”Contact Us” color=”info” link=”url:https%3A%2F%2Flatticegear.com%2Fcontact-latticegear%2F|title:Contact%20Us|target:%20_blank”][/vc_column_inner][/vc_row_inner][vc_row_inner][vc_column_inner width=”1/4″][vc_column_text]

4x3mm sample prepared using the LatticeAx

[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text]

Cleaving electronic structures fabricated at 45 degrees to Silicon (100)

[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text]

LatticeAx diamond indenter separating the MEMS device from the lid.

[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text][/vc_column_text][/vc_column_inner][/vc_row_inner][/vc_column][/vc_row][vc_row][vc_column][vc_column_text]Publications (contact lg@latticegear.com for copies of these publications)[/vc_column_text][/vc_column][/vc_row][vc_row][vc_column width=”1/4″][vc_column_text]Global Foundries[/vc_column_text][/vc_column][vc_column width=”3/4″][vc_column_text]A Controlled Mechanical Method for MEMS Decapsulation (poster)[/vc_column_text][/vc_column][/vc_row][vc_row][vc_column width=”1/4″][vc_column_text]University of Copenhagen:[/vc_column_text][/vc_column][vc_column width=”3/4″][vc_column_text]Successful Cleaving of Delicate Nanostructures[/vc_column_text][/vc_column][/vc_row][vc_row][vc_column width=”1/4″][vc_column_text]Solid State Technology: [/vc_column_text][/vc_column][vc_column width=”3/4″][vc_column_text]From Transistors to Bumps: Preparing SEM Cross-Sections by Combining Site-specific Cleaving and Broad Ion Beam Milling[/vc_column_text][/vc_column][/vc_row][vc_row][vc_column width=”1/4″][vc_column_text]EDFA Journal:[/vc_column_text][/vc_column][vc_column width=”3/4″][vc_column_text]Cleaving Breakthrough: A New Method Removes Old Limitations[/vc_column_text][/vc_column][/vc_row][vc_row][vc_column][vc_btn title=”Advanced Materials Use Cases” color=”info” link=”url:https%3A%2F%2Flatticegear.com%2Fnew%2Fuse-cases-and-publications%2Fadvanced-materials%2F||”][/vc_column][/vc_row]